Jong Doo Lee

Title: Innovations by Jong Doo Lee

Introduction

Jong Doo Lee is a notable inventor based in Gyeongju-si, South Korea. He has made significant contributions to the field of substrate treatment technology. With a total of 3 patents to his name, his work reflects a commitment to advancing industrial processes.

Latest Patents

One of Jong Doo Lee's latest patents is an "Apparatus for treating substrate." This innovative apparatus includes a process chamber with a first and second body that create a treating space for substrates. A friction prevention member is strategically placed on the contact surface between the two bodies, featuring a groove that enhances adhesion. Another significant patent is the "Substrate treating apparatus and substrate treating method." This invention comprises a process chamber that provides a treatment space, a fluid supply unit, and an exhaust unit. The controller of the fluid supply unit ensures efficient operation by draining fluid shortly before it is supplied into the process chamber.

Career Highlights

Jong Doo Lee has established himself as a key figure in his field through his inventive work. He is currently employed at Semes Co., Ltd., where he continues to develop innovative solutions for substrate treatment.

Collaborations

Some of his coworkers include Sang Min Lee and Seung Hoon Oh, who contribute to the collaborative environment at Semes Co., Ltd.

Conclusion

Jong Doo Lee's contributions to substrate treatment technology demonstrate his innovative spirit and dedication to improving industrial processes. His patents reflect a deep understanding of the complexities involved in substrate treatment, positioning him as a valuable inventor in his field.