Gwangju, South Korea

Jong Chul Kim

This inventor holds 2 USPTO granted patents and 5 published patent applications. Top assignee: Jusung Engineering Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jong Chul Kim. Retrieved from https://idiyas.com/inventor/jong-chul-kim-mnisl9g1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Jong Chul Kim: Innovator in Substrate Transfer Technology

Introduction

Jong Chul Kim is a notable inventor based in Gwangju, South Korea. He has made significant contributions to the field of substrate transfer technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and accuracy of substrate handling in various applications.

Latest Patents

Jong Chul Kim holds a patent for a "Substrate transfer method and substrate transfer device." This invention relates to a substrate transfer method and apparatus that controls a substrate transfer robot using position information of a substrate during loading or unloading. The technology allows for automatic reference value setting, ensuring that the substrate is accurately positioned in the center of the susceptor, even when manual adjustments are not made.

Career Highlights

Jong Chul Kim is associated with Jusung Engineering Co., Ltd., where he applies his expertise in substrate transfer systems. His innovative approach has led to advancements in the efficiency of substrate handling processes, making significant impacts in the industry.

Collaborations

Some of his coworkers include Gu Hyun Jung and Jin An Jung, who contribute to the collaborative efforts in developing cutting-edge technologies in substrate transfer.

Conclusion

Jong Chul Kim's contributions to substrate transfer technology exemplify the importance of innovation in enhancing industrial processes. His patent reflects a commitment to improving efficiency and accuracy in substrate handling, marking him as a key figure in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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