The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Nov. 02, 2020
Applicant:

Jusung Engineering Co., Ltd., Gwangju-si, KR;

Inventors:

In Woo Back, Gwangju-si, KR;

Jong Chul Kim, Gwangju-si, KR;

Yeong Seop Byeon, Gwangju-si, KR;

In Cheol Yeo, Gwangju-si, KR;

Chul Joo Hwang, Gwangju-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01); G01J 5/00 (2022.01); G01J 5/02 (2022.01); G01J 5/48 (2022.01);
U.S. Cl.
CPC ...
H10P 72/0602 (2026.01); G01J 5/0007 (2013.01); G01J 5/025 (2013.01); G01J 5/485 (2022.01); G01J 2005/0077 (2013.01); G01J 2005/0092 (2013.01);
Abstract

The present inventive concept relates to a substrate processing apparatus comprising: a chamber providing a processing space; a lid for covering the top of the chamber; a substrate support part supporting at least one substrate and rotating about a rotation axis such that the substrate passes through an imaging area; a gas injection part for injecting a process gas toward the substrate support part; an area image capturing part for capturing an image of the imaging area to obtain a thermal image of the imaging area; and a calculation part for calculating the temperature data of the substrate from the thermal image.


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