Jonathan Shaw

Title: Jonathan Shaw: Semiconductor Resistor Innovations

Introduction

Jonathan Shaw is an inventor associated with Fort Collins, Colorado, whose patent work includes semiconductor resistor designs for reducing parasitic capacitance and enabling resistance control. His portfolio includes 4 patents.

Latest Patents

“Reduced Capacitance Resistors” describes a method and resistor design intended to reduce parasitic capacitance. The design uses an implanted region within a well or substrate to create a depletion region that acts as a series capacitor, lowering the overall capacitance. Connecting the well or substrate to ground or a selected voltage can further expand the depletion region and reduce capacitance.

“High Performance Diode-Implanted Voltage-Controlled Poly Resistors for Mixed-Signal and RF Applications” describes a p-type polysilicon resistor containing an implanted diode. Applying a positive voltage modulates the diode’s depletion region and changes the resistor’s resistance. The design supports modulation in both horizontal and vertical directions and uses polysilicon, a material already used in basic CMOS processing.

Career Highlights

Shaw’s listed company affiliations include LSI Logic Corporation and LSI Corporation. His patent work reflects an emphasis on resistor structures for semiconductor, mixed-signal, and radio-frequency applications.

Collaborations

Shaw’s listed coworkers include Sean Christopher Erickson and Kevin Roy Nunn.

Conclusion

Jonathan Shaw’s inventions address practical challenges in semiconductor circuit design by reducing resistor capacitance and enabling voltage-controlled resistance.