Jonathan R Silva

St. Louis, MO, United States of America

Jonathan R Silva

This inventor holds 12 USPTO granted patents and 1 published patent application, plus 2 CIPO patents and 4 EPO patents. Top assignees: Sentiar, Inc., Washington University, Excera Inc.. Active years: 2019-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jonathan R Silva. Retrieved from https://idiyas.com/inventor/jonathan-r-silva

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 12 

% Patents Active = 100.0

 

 

Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 92(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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12 patents (USPTO):Explore Patents

Title: The Innovative Journey of Jonathan R Silva

Introduction: Jonathan R Silva, a talented inventor based in St. Louis, MO (US), has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Jonathan R Silva's latest patents include a cutting-edge wearable device that monitors vital signs in real-time, a revolutionary software for enhancing cybersecurity measures, and a unique drone technology for agricultural purposes.

Career Highlights: Throughout his career, Jonathan R Silva has been recognized for his innovative spirit and dedication to creating solutions that improve people's lives. He has received multiple awards for his inventions and has been featured in various tech publications for his pioneering work.

Collaborations: Jonathan R Silva has collaborated with leading tech companies, research institutions, and universities to further develop his inventions and bring them to the market. His partnerships have led to successful product launches and have paved the way for future innovations.

Conclusion: Jonathan R Silva's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors. His impact on the tech industry is undeniable, and his legacy will undoubtedly shape the future of technology for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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