Columbus, OH, United States of America

Jonathan P Pelz


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2005-2006

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2 patents (USPTO):Explore Patents

Title: Innovations by Jonathan P Pelz

Introduction

Jonathan P Pelz is an accomplished inventor based in Columbus, OH (US). He has made significant contributions to the field of capacitance measurement, holding a total of 2 patents. His work is particularly relevant in the context of scanning capacitance microscopy, which has applications in various scientific and engineering domains.

Latest Patents

Pelz's latest patents include a method for measuring nm-scale tip-sample capacitance. This innovative method involves measuring cantilever deflection and changes in probe-sample capacitance relative to a reference level as a function of probe assembly height. The process includes fitting out-of-contact data to a function, subtracting this function from capacitance data to obtain a residual capacitance, and determining the residual capacitance at a z-position where the cantilever deflection is zero. Another notable patent is for a direct, low-frequency capacitance measurement system for scanning capacitance microscopy. This system allows for accurate measurement of capacitance between a probe and a semiconductor sample, while also providing a method for analyzing measured capacitance data by accounting for changes in long-range stray capacitance.

Career Highlights

Jonathan P Pelz is affiliated with The Ohio State University, where he continues to advance research in his field. His work has garnered attention for its practical applications and innovative approaches to capacitance measurement.

Collaborations

Pelz has collaborated with notable colleagues, including David T Lee and Bharat Bhushan. These collaborations have contributed to the development of his patents and the advancement of research in capacitance measurement techniques.

Conclusion

Jonathan P Pelz is a prominent inventor whose work in capacitance measurement has led to significant advancements in the field. His contributions, particularly through his patents, continue to influence research and applications in scanning capacitance microscopy.

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