Jonathan Laib

Title: Innovations by Jonathan Laib

Introduction

Jonathan Laib is an accomplished inventor based in Portland, OR (US). He has made significant contributions to the field of integrated circuit technology. With a total of two patents to his name, Laib's work focuses on enhancing interconnect structures in integrated circuits.

Latest Patents

Laib's latest patents include "Self Aligned Gratings for Tight Pitch Interconnects and Methods of Fabrication." This patent describes an integrated circuit interconnect structure that features a first metallization level with a first metal line and a second metal line, separated by a dielectric. The design includes a second metallization level above the first, which contains a third metal line extending orthogonally to the first direction. The innovative aspect of this patent lies in the conductive via that connects the first metal line to the third metal line without extending beyond the sidewalls of the first metal line.

Career Highlights

Jonathan Laib is currently employed at Intel Corporation, where he continues to push the boundaries of technology. His work has been instrumental in developing advanced interconnect solutions that are crucial for modern electronic devices.

Collaborations

Laib collaborates with notable colleagues such as Manish Chandhok and Leonard P. Guler. Their combined expertise contributes to the innovative projects at Intel Corporation.

Conclusion

Jonathan Laib's contributions to integrated circuit technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in electronic interconnect structures.