Jonathan Cheang-Whang Chang

Title: Innovations by Jonathan Cheang-Whang Chang

Introduction

Jonathan Cheang-Whang Chang is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the reliability and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is titled "In-line reliability test using E-beam scan." This method involves testing a semiconductor wafer with a test structure by performing an E-beam stress scan to electrically stress the structure, which helps in identifying stress defects. Another innovative patent is the "Method of directionally trimming polysilicon width." This process utilizes two layers of photoresist and a photoresist etching technique to selectively trim polysilicon or other materials, allowing for precise adjustments without compromising the integrity of the underlying structures.

Career Highlights

Jonathan Chang is currently employed at Xilinx, Inc., where he continues to push the boundaries of semiconductor technology. His expertise in the field has led to advancements that are crucial for the development of modern electronic devices.

Collaborations

He has collaborated with notable coworkers such as David Kuan-Yu Liu and Brian J Wollard, contributing to a dynamic and innovative work environment.

Conclusion

Jonathan Cheang-Whang Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of electronic device reliability and performance.