Company Filing History:
1 out of 127 
1 out of 57 Years Active: 2007-2008
Title: Jon Metivier: Innovator in Photosensitive Resin Compositions
Introduction
Jon Metivier is a notable inventor based in Billerica, MA (US). He has made significant contributions to the field of photosensitive resin compositions, holding a total of 2 patents. His work has been instrumental in advancing technologies related to photolithography and material science.
Latest Patents
Metivier's latest patents focus on innovative photosensitive resin compositions. The first patent describes a positive-working photosensitive composition that includes one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound, and at least one solvent. This composition is designed to form a relief pattern on a substrate, thereby creating a coated substrate. The second patent also pertains to a positive photosensitive resin composition, further showcasing his expertise in this area.
Career Highlights
Throughout his career, Jon Metivier has worked with prominent companies such as Fujifilm Electronic Materials U.S.A., Inc. and Arch Specialty Chemicals, Inc. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in the industry.
Collaborations
Metivier has collaborated with talented individuals in his field, including Ahmad A Naiini and Richard Hopla. These partnerships have fostered innovation and have been crucial in the development of his patented technologies.
Conclusion
Jon Metivier's contributions to the field of photosensitive resin compositions highlight his role as an influential inventor. His patents and collaborations reflect a commitment to innovation and excellence in material science.