The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2008
Filed:
Feb. 18, 2005
Ahmad A. Naiini, East Greenwich, RI (US);
Richard Hopla, Cranston, RI (US);
David B. Powell, Minnetonka, MN (US);
Jon Metivier, Billerica, MA (US);
Il'ya Rushkin, Walpole, MA (US);
Ahmad A. Naiini, East Greenwich, RI (US);
Richard Hopla, Cranston, RI (US);
David B. Powell, Minnetonka, MN (US);
Jon Metivier, Billerica, MA (US);
Il'ya Rushkin, Walpole, MA (US);
Fujifilm Electronic Materials U.S.A., Inc., North Kingstown, RI (US);
Abstract
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.