Company Filing History:
5 out of 127 
1 out of 57 Years Active: 2006-2010
Title: The Innovations of David B Powell
Introduction
David B Powell is a notable inventor based in Minnetonka, MN (US). He has made significant contributions to the field of materials science, particularly in the development of photosensitive compositions. With a total of 6 patents to his name, Powell's work has had a considerable impact on various industries.
Latest Patents
Among his latest patents is a heat-resistant positive-working photosensitive polybenzoxazole precursor composition. This innovative composition comprises photosensitive resin compositions that include one or more polybenzoxazole precursor polymers. It also features a diazonaphthoquinone photoactive compound, which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound. The use of such compositions allows for the formation of a relief pattern on a substrate, thereby creating a coated substrate.
Career Highlights
David B Powell has worked with prominent companies in the industry, including Fujifilm Electronic Materials U.S.A., Inc. and Arch Specialty Chemicals, Inc. His experience in these organizations has contributed to his expertise in developing advanced materials and technologies.
Collaborations
Throughout his career, Powell has collaborated with talented individuals such as Ahmad A Naiini and Richard Hopla. These collaborations have further enriched his work and led to innovative solutions in the field.
Conclusion
David B Powell's contributions to the field of materials science and his innovative patents highlight his role as a significant inventor. His work continues to influence advancements in photosensitive compositions and related technologies.