Jon M Long

Title: Jon M Long: Innovator in Microelectronic Substrates

Introduction

Jon M Long is a notable inventor based in Boise, ID (US), recognized for his contributions to the field of microelectronics. With a total of 3 patents, he has made significant advancements in the design and manufacturing of microelectronic substrates.

Latest Patents

One of Jon's latest patents focuses on thin microelectronic substrates and methods of manufacture. This innovative microelectronic substrate features a body with a first surface and a second surface, which faces in the opposite direction. The substrate includes a plurality of voids that extend from the first surface to a separation region beneath it. At least one operable microelectronic device is formed at or near the first surface. The design allows for the first stratum of the substrate above the separation region to be separated from the second stratum below it. Furthermore, the first stratum can be divided into discrete microelectronic dies before being separated from the second stratum. This substrate can also support a film, enabling the formation of microelectronic devices within the film and/or the substrate itself.

Career Highlights

Jon M Long is currently employed at Micron Technology Incorporated, a leading company in the semiconductor industry. His work has contributed to the advancement of microelectronic technologies, enhancing the efficiency and functionality of electronic devices.

Collaborations

Throughout his career, Jon has collaborated with notable colleagues, including Charles E Larson and Timothy E Murphy. These partnerships have fostered innovation and development in the field of microelectronics.

Conclusion

Jon M Long's work in microelectronic substrates exemplifies the spirit of innovation in technology. His patents and contributions continue to influence the industry, paving the way for future advancements.