Saratoga Springs, NY, United States of America

Jon Greenwood

This inventor holds 1 USPTO granted patent. Top assignee: Globalfoundries Inc.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jon Greenwood. Retrieved from https://idiyas.com/inventor/jon-greenwood

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Jon Greenwood: Innovator in Semiconductor Technology

Introduction

Jon Greenwood is a notable inventor based in Saratoga Springs, NY (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for processing semiconducting substrates.

Latest Patents

Jon Greenwood holds a patent titled "Methods of thinning and/or dicing semiconducting substrates having integrated circuit products formed thereon." This patent describes a method that includes forming a plurality of die above a crystalline semiconducting substrate. It involves irradiating and cooling an edge region of the substrate to create an amorphous region, followed by a process operation to reduce the substrate's thickness. He has 1 patent to his name.

Career Highlights

Jon Greenwood is currently employed at GlobalFoundries Inc., a leading company in semiconductor manufacturing. His work focuses on advancing technologies that enhance the efficiency and performance of integrated circuits.

Collaborations

Throughout his career, Jon has collaborated with talented professionals, including Rahul Agarwal and Ramakanth Alapati. These collaborations have contributed to the development of innovative solutions in the semiconductor industry.

Conclusion

Jon Greenwood's contributions to semiconductor technology through his patent and work at GlobalFoundries Inc. highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of integrated circuit manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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