Ballston Lake, NY, United States of America

Jon Fayad


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Jon Fayad: Innovator in Organic Layer Technologies

Introduction

Jon Fayad, a distinguished inventor based in Ballston Lake, NY, has made significant contributions to the field of organic materials used in electronics. With a keen focus on enhancing the performance of organic planarization layers, Fayad has obtained one patent that showcases his expertise and innovative approach in this niche area.

Latest Patents

Fayad's notable patent is for a method titled "Solvent annealing of an organic planarization layer." This innovative method involves depositing an organic planarization layer on a surface using a spin-on deposition approach, followed by treatment with a solvent anneal. Specifically, the patented process allows vapor of the solvent to pass over the deposited layer, promoting uniformity and improving its properties. Additionally, the method includes curing the deposited layer through thermal annealing, further enhancing its performance in various applications.

Career Highlights

Throughout his career, Jon Fayad has had the opportunity to work with esteemed companies, including the International Business Machines Corporation (IBM) and Screen Spe USA LLC. His experience at these organizations has undoubtedly contributed to his skills and enabled him to advance in the realm of organic electronics.

Collaborations

Fayad collaborated with talented scientists and engineers, including Jing Guo and Wenyu Xu. These professional partnerships have likely fostered a creative environment that enhances the design and development of innovative technologies in the organic layer field.

Conclusion

As an inventor, Jon Fayad exemplifies the spirit of innovation in his work related to organic planarization layers. His patented method has the potential to influence many applications in the electronics industry, underscoring the importance of continued innovation in materials science.

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