The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2025
Filed:
Dec. 17, 2021
International Business Machines Corporation, Armonk, NY (US);
Screen Spe Usa Llc, Sunnyvale, CA (US);
Jing Guo, Niskayuna, NY (US);
Wenyu Xu, Albany, NY (US);
Indira Seshadri, Niskayuna, NY (US);
Luciana Meli-Thompson, Albany, NY (US);
Dustin Wayne Janes, Albany, NY (US);
Jon Fayad, Ballston Lake, NY (US);
Eric Evans, Saratoga, NY (US);
Domenico DiPaola, Glasco, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
SCREEN SPE USA LLC, Sunnyvale, CA (US);
Abstract
A method for forming a planarization layer is provided that can include depositing an organic planarization layer on a deposition surface using a spin on deposition method; and treating the deposited organic planarization layer with a solvent anneal. In some embodiments, a vapor of solvent is passed over the deposited organic planarization layer to increase uniformity of the deposited organic planarization layer. The method may further include curing the deposited organic planarization layer with a thermal anneal.