This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Imec Vzw. Active years: 2010.
Company Filing History:
Years Active: 2010
Title: The Innovative Contributions of Joke Van Aelst
Introduction
Joke Van Aelst is a prominent inventor based in Heusden-Zolder, Belgium. She has made significant contributions to the field of semiconductor technology, particularly in the area of patterning high aspect ratio vias. Her work is essential for advancing three-dimensional stacked semiconductor devices and structures.
Latest Patents
Joke Van Aelst holds a patent for a method titled "High aspect ratio via etch." This innovative method provides a dry etching technique for patterning deep vias or vias with high aspect ratios. The process effectively eliminates the hard mask undercut, allowing for the creation of deep vias in a substrate. This method enables the patterning of deep vias with an aspect ratio of up to 10 into a silicon substrate, ensuring smooth via sidewalls and sufficient slope for metallization.
Career Highlights
Joke Van Aelst is currently employed at Imec, a leading research and innovation hub in nanoelectronics and digital technologies. Her work at Imec has positioned her as a key player in the development of advanced semiconductor technologies. With her expertise, she has contributed to various projects that push the boundaries of what is possible in the field.
Collaborations
Joke has collaborated with notable colleagues, including Herbert Struyf and Serge Vanhaelemeersch. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.
Conclusion
Joke Van Aelst's contributions to semiconductor technology through her innovative patent and work at Imec highlight her importance in the industry. Her dedication to advancing technology continues to inspire future innovations.