Company Filing History:
1 out of 164,197 
1 out of 716 Years Active: 1999-2011
Title: Innovations of John William Kay
Introduction
John William Kay is an accomplished inventor based in Lagrangeville, NY (US). He holds two patents that showcase his expertise in digital-to-analog conversion and high-speed electron beam lithography. His contributions to the field have significantly advanced technology in these areas.
Latest Patents
One of his latest patents is titled "Methods and systems for testing digital-to-analog converter/amplifier circuits." This invention involves a testing system for digital-to-analog converters (DAC) and amplifiers used in electron-beam mask writers. The system includes a summation circuit that sums voltage signals and an analyzer circuit that digitizes the summation signal to detect operational errors in the DAC/amplifier circuits.
Another notable patent is the "High speed electron beam lithography pattern processing system." This system comprises a pattern storage device, a RAID pattern memory buffer, and a shape processor that utilizes a programmable gate array device (FPGA) for high-speed processing. The system allows for efficient storage and processing of pattern data, enhancing the capabilities of electron beam lithography.
Career Highlights
Throughout his career, John William Kay has worked with prominent companies such as IBM and Nuflare Technology, Inc. His experience in these organizations has contributed to his innovative work and the development of his patents.
Collaborations
John has collaborated with notable coworkers, including Eileen Veronica Clarke and Christine Ann Kostek. Their teamwork has likely played a role in the successful development of his inventions.
Conclusion
John William Kay's contributions to the fields of digital-to-analog conversion and electron beam lithography are significant. His patents reflect his innovative spirit and dedication to advancing technology.