International Business Machines Corporation

Nuflare Technology, Inc.

John William Kay

John Matthew Safran

Yoshikuni Goshima

Seiichi Tsuchiya

Chising Lai

Yoshimasa Sanmiya

Jon Erik Lieberman

Daniel Lee Pierce

Robert Joseph Quickle

Christine Ann Kostek

Eileen Veronica Clarke

A digital-to-analog converter (DAC)/amplifier testing system for use in an electron-beam (e-beam) mask writer, the e-beam mask writer including a plurality of DAC/amplifier circuits to output analog voltage signals, each DAC/amplifier circuit having a first output terminal and a second output terminal, the first output terminals of the plurality of DAC/amplifier circuits being respectively coupled to deflection plates of the e-beam mask writer to provide the output analog voltages as deflection voltages, is provided. The testing system including a summation circuit to sum voltage signals and to output a summation signal indicating the sum of the received analog voltage signals and an analyzer circuit to digitize the summation signal and to detect to compare the digitized summation signal with an error tolerance range to detect whether at least one of the DAC/amplifier circuits is experiencing an operating error.

Methods and systems for testing digital-to-analog converter/amplifier circuits

A pattern data processor system is disclosed that comprises a pattern storage device for storing pattern data, a Redundant Array of Independent Disks (RAID) pattern memory buffer for receiving and temporarily holding the pattern data from the pattern storage device, a shape processor for processing and decoding the pattern data, a shape divider, and a shape generator for generating a shape from the decoded pattern data. The shape processor comprises a programmable gate array device (FPGA) that dynamically decodes different pattern data formats with different decoding schemes, allowing for high speed processing. A Previous Output Shape (POS) Register is also disclosed, which uses information from previous shapes to decompress new shapes, thus allowing for variable length macro and pattern data, and conserving disk space.

High speed electron beam lithography pattern processing system

Growing community of inventors

Lagrangeville, NY, United States of America

John William Kay