Tinton Falls, NJ, United States of America

John W Lott

This inventor holds 5 USPTO granted patents. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1981-1990.


% Patents Active = 100.0

Average Co-Inventor Count = 2.5

ph-index = 5

Forward Citations = 113(Granted Patents)


Location History:

  • Tinton Falls, NJ (US) (1981 - 1984)
  • Durham, NC (US) (1990)

Company Filing History:


Years Active: 1981-1990

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5 patents (USPTO):Explore Patents

Title: The Innovations of John W. Lott

Introduction

John W. Lott is a notable inventor based in Tinton Falls, NJ (US), recognized for his contributions to the field of integrated circuits and flexible electronics. With a total of 5 patents to his name, Lott has made significant advancements that have impacted the technology industry.

Latest Patents

Among his latest patents, Lott has developed a "Chip carrier package and method of manufacture," which features an improved integrated chip carrier package containing closely spaced electrical leads. This design facilitates better contact with the leads from the chip. Additionally, he has patented a "Process for the preparation of flexible circuits," which involves creating flexible circuits from photohardenable elements that include at least one organic elastomeric polymeric binder.

Career Highlights

Lott has built a successful career at E.I. du Pont de Nemours and Company, where he has been instrumental in driving innovation in electronic packaging and flexible circuit technology. His work has contributed to the development of more efficient and reliable electronic components.

Collaborations

Throughout his career, Lott has collaborated with talented individuals such as Douglas M. Haney and Sam Andreades, further enhancing the innovative environment in which he works.

Conclusion

John W. Lott's contributions to the field of electronics through his patents and collaborations highlight his role as a significant inventor. His work continues to influence the development of advanced technologies in the industry.

Profile summary based on public USPTO records.
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