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For the Inventor, By the Inventor

Sunnyvale, CA, United States of America

John Vincent Schmitt

This inventor holds 14 USPTO granted patents, primarily in Semiconductor Processing. Top assignee: Applied Materials, Inc.. Active years: 1999-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John Vincent Schmitt. Retrieved from https://idiyas.com/inventor/john-vincent-schmitt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 14

% Patents Active = 100.0

Average Co-Inventor Count = 1.8

ph-index = 8

Forward Citations = 1,020(Granted Patents)


Company Filing History:

goldMedal14 out of 14,523 
 
Applied Materials, Inc.
 patents

Years Active: 1999-2003

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Areas of Expertise:
Vaporization
Deposition
Substrate Processing
Chemical Vapor Deposition
Control Systems
Heat Trace
Process Materials
Flow Control
Monitoring
Precursor Conversion
14 patents (USPTO):Explore Patents
1. 6596085 - Methods and apparatus for improved vaporization of deposition material in a substrate processing system (2003-07-22),
2. 6498898 - Uniform heat trace and secondary containment for delivery lines for processing system (2002-12-24),
3. 6402806 - Method for unreacted precursor conversion and effluent removal (2002-06-11),
4. 6358323 - Method and apparatus for improved control of process and purge material in a substrate processing system (2002-03-19),
5. 6251759 - Method and apparatus for depositing material upon a semiconductor wafer using a transition chamber of a multiple chamber semiconductor wafer processing system (2001-06-26),
6. 6202656 - Uniform heat trace and secondary containment for delivery lines for processing system (2001-03-20),
7. 6179925 - Method and apparatus for improved control of process and purge material in substrate processing system (2001-01-30),
8. 6176930 - Apparatus and method for controlling a flow of process material to a deposition chamber (2001-01-23),
9. 6099649 - Chemical vapor deposition hot-trap for unreacted precursor conversion (2000-08-08),
10. 6098964 - Method and apparatus for monitoring the condition of a vaporizer for (2000-08-08),
11. 6038919 - Measurement of quantity of incompressible substance in a closed container (2000-03-21),
12. 5981295 - Ampule with integral filter (1999-11-09),
13. 5972117 - Method and apparatus for monitoring generation of liquid chemical vapor (1999-10-26),
14. 5879947 - Apparatus and method for detecting DMAH using particle sensing detector (1999-03-09),

Title: The Innovations of John Vincent Schmitt

Introduction

John Vincent Schmitt is a prominent inventor based in Sunnyvale, CA, known for his significant contributions to the field of substrate processing systems. With a total of 14 patents to his name, Schmitt has made remarkable advancements in chemical vapor deposition technologies.

Latest Patents

One of Schmitt's latest patents is titled "Methods and apparatus for improved vaporization of deposition material in a substrate processing system." This patent describes a deposition system that includes a deposition chamber and a vaporizer connected to the chamber. The vaporizer features a relatively short mixing passageway that effectively mixes a carrier gas with a liquid precursor, resulting in a fine aerosol-like dispersion of the liquid precursor, which is then vaporized by a hot plate. Another notable patent is "Uniform heat trace and secondary containment for delivery lines for processing system," which enhances the efficiency and safety of the delivery lines in processing systems.

Career Highlights

Schmitt is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to develop innovative solutions that improve the performance and reliability of substrate processing systems.

Collaborations

Throughout his career, Schmitt has collaborated with talented individuals such as Ling Chen and Mei Yin Chang. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in the field.

Conclusion

John Vincent Schmitt's contributions to the field of substrate processing systems are noteworthy, with his innovative patents and collaborations driving advancements in technology. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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