John Valcore, Jr

Title: John Valcore, Jr.: Innovator in Arc Detection Technology

Introduction

John Valcore, Jr. is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of arc detection technology, holding a total of 2 patents. His work focuses on enhancing the safety and efficiency of RF plasma chambers.

Latest Patents

One of his latest patents is the Harmonic Derived Arc Detector. This innovative arc detection system includes a radio frequency (RF) signal probe that senses an RF signal at the input of an RF plasma chamber. The probe generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives this signal, monitors it for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on these frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber, thereby enhancing operational safety.

Career Highlights

John Valcore, Jr. is currently employed at MKS Instruments, Inc., where he continues to develop innovative solutions in the field of plasma technology. His expertise and dedication to research have positioned him as a key player in his industry.

Collaborations

Throughout his career, Valcore has collaborated with talented individuals such as Yufeng Han and Jonathan W. Smyka. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

John Valcore, Jr. is a distinguished inventor whose work in arc detection technology has made a significant impact in the field. His contributions continue to advance the safety and efficiency of RF plasma chambers, showcasing his commitment to innovation.