John Turn

Title: Innovations of John Turn in Metal Oxide Sputtering Targets

Introduction

John Turn is an accomplished inventor based in Chestnut Ridge, NY (US). He has made significant contributions to the field of materials science, particularly in the development of metal oxide sputtering targets. With a total of 2 patents, his work has advanced the technology used in various applications.

Latest Patents

John Turn's latest patents include an "Apparatus and method for making metal oxide sputtering targets." This invention describes an apparatus and process for creating metal oxide sputtering targets from volatile and thermally unstable metal oxide powder. The method involves hot-pressing the metal oxide powder in a graphite die assembly that features a ceramic barrier sleeve. This design isolates the metal oxide powder from the graphite die assembly components, enhancing the quality of the sputtering targets. Another notable patent is the "Method for making metal oxide sputtering targets (barrier powder)." This invention also focuses on the production of metal oxide sputtering targets, utilizing a barrier material to envelop the metal oxide powder during the hot-pressing process.

Career Highlights

Throughout his career, John Turn has worked with prominent companies such as Praxair S.T. Technology, Inc. and Sony Corporation. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in the field of materials science.

Collaborations

John has collaborated with notable colleagues, including Chi-Fung Lo and David P. Strauss. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

John Turn's contributions to the field of metal oxide sputtering targets demonstrate his innovative spirit and dedication to advancing technology. His patents and collaborations reflect a commitment to excellence in materials science.