Company Filing History:
Years Active: 1984-2010
Title: Innovations of John S Vavruska
Introduction
John S Vavruska is a notable inventor based in Santa Fe, NM (US). He holds a total of 8 patents that showcase his contributions to the field of energy production and materials science. His work primarily focuses on advanced technologies for converting carbonaceous compounds into usable fuels and materials.
Latest Patents
One of his latest patents involves the "Inductively coupled plasma/partial oxidation reformation of carbonaceous compounds to produce fuel for energy production." This innovative process utilizes inductively coupled plasma (ICP) reforming to convert various carbonaceous feedstocks, such as coal and marine diesel, into fuel suitable for generating electrical power. The system enhances overall efficiency by incorporating partial oxidation, which optimizes thermal energy use and increases net electrical power production.
Another significant patent is for the "Continuous production of carbon nanomaterials using a high temperature inductively coupled plasma." This technology employs high-power ICP to thermally crack and vaporize carbonaceous materials into elemental carbon. The process allows for the continuous growth and collection of carbon nanomaterials, which can be produced in industrial-scale quantities.
Career Highlights
Throughout his career, John has worked with several prominent companies, including Plasmet Corporation and Alliant Techsystems Inc. His experience in these organizations has contributed to his expertise in energy systems and materials development.
Collaborations
John has collaborated with notable professionals in his field, including Andreas S Blutke and Robert L Ferguson. Their joint efforts have further advanced the research and development of innovative technologies.
Conclusion
John S Vavruska's contributions to the fields of energy production and materials science are significant. His innovative patents reflect a commitment to advancing technology for sustainable energy solutions.