The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2000
Filed:
Feb. 12, 1999
Applicant:
Inventors:
Andreas S Blutke, Seattle, WA (US);
Edward M Bohn, Burien, WA (US);
Robert S Ottinger, Aurora, OH (US);
Michel G Tuszewski, Los Alamos, NM (US);
John S Vavruska, Santa Fe, NM (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912159 ; 21912143 ; 21912155 ; 21912148 ; 110346 ; 31511121 ;
Abstract
A method for optimizing the efficiency of an inductively coupled plasma (ICP) torch by varying at least one of a plasma gas flow rate and a power level applied to energize the ICP torch, and method and apparatus for efficiently using a CO.sub.2 feed as both a reactant and for generating a thermal plasma to produce high value chemical feed stocks, such as a synthesis gas or carbon monoxide from low value feedstocks, such as methane or carbon.