Robert S Ottinger

Title: The Innovative Contributions of Robert S. Ottinger

Introduction

Robert S. Ottinger is an accomplished inventor based in Aurora, OH (US). He has made significant contributions to the field of plasma technology, particularly in optimizing the efficiency of inductively coupled plasma (ICP) systems. His innovative approach has the potential to revolutionize various thermal-chemical processes.

Latest Patents

One of Ottinger's notable patents is titled "Use of a chemically reactive plasma for thermal-chemical processes." This patent describes a method for enhancing the efficiency of an ICP torch by adjusting the plasma gas flow rate and the power level applied to energize the torch. Additionally, it outlines a method and apparatus for effectively utilizing a CO₂ feed as both a reactant and a means to generate thermal plasma. This process aims to produce high-value chemical feedstocks, such as synthesis gas or carbon monoxide, from low-value feedstocks like methane or carbon.

Career Highlights

Throughout his career, Ottinger has demonstrated a commitment to advancing plasma technology. His work has not only contributed to the scientific community but has also paved the way for practical applications in various industries. His innovative methods are expected to lead to more efficient and sustainable processes in chemical production.

Collaborations

Ottinger has collaborated with several professionals in his field, including Andreas S. Blutke and Edward M. Bohn. These collaborations have fostered a productive environment for innovation and have led to the development of cutting-edge technologies.

Conclusion

Robert S. Ottinger's contributions to the field of plasma technology exemplify the spirit of innovation. His patent on optimizing ICP systems showcases his dedication to improving efficiency in thermal-chemical processes. Through his work and collaborations, Ottinger continues to influence the future of chemical production.