Company Filing History:
5 out of 13,713 
2 out of 832,843 Years Active: 2001-2013
Title: The Innovative Ingenuity of John Ruffell
Introduction
John Ruffell, an accomplished inventor based in Sunnyvale, CA, has made significant contributions to the field of ion implantation technology. With a portfolio of seven patents to his name, Ruffell's work focuses primarily on advancements in the methods and apparatuses for multi-directional scanning of charged particle beams.
Latest Patents
Among his most recent patents is the "Apparatus and method for multi-directionally scanning a beam of charged particles." This invention details a sophisticated ion implant apparatus that employs an ion source for generating an ion beam along an incident beam axis. The apparatus features a beam deflecting assembly linked to a rotation mechanism, allowing for precise control over the direction of the ion beam while maintaining a constant implant angle on target wafers.
Another notable patent by Ruffell is titled "Systems and methods for scanning a beam of charged particles." Similar in design to his previous work, this invention also incorporates a beam deflecting assembly and rotation mechanism, highlighting his commitment to refining ion implantation technology for enhanced efficiency and accuracy.
Career Highlights
Throughout his career, John Ruffell has demonstrated exceptional innovation within the semiconductor industry. He has been employed at Applied Materials, Inc., a leading provider of manufacturing equipment for the semiconductor industry. His work there has contributed to the advancement of ion implantation techniques that are crucial for developing modern electronic devices.
Collaborations
Ruffell has worked alongside notable colleagues, such as Robert J. C. Mitchell and Keith D. Relleen. Collaborating with fellow experts has likely enriched his inventive journey and has provided opportunities to exchange innovative ideas that drive technological advancements in the field.
Conclusion
John Ruffell’s inventive contributions reflect his expertise and dedication to advancing ion implantation technology. With a robust portfolio of patents under his belt, his innovations not only shape the future of the semiconductor industry but also exemplify the spirit of progress that defines true invention.