Albany, NY, United States of America

John R Sporre

This inventor holds 3 USPTO granted patents and 6 published patent applications. Top assignee: Adeia Semiconductor Solutions LLC. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John R Sporre. Retrieved from https://idiyas.com/inventor/john-r-sporre

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 5.6

ph-index = 1


Company Filing History:


Years Active: 2024-2025

Loading Chart...
3 patents (USPTO):Explore Patents

Title: John R. Sporre: Innovator in Nanosheet Semiconductor Technology

Introduction: John R. Sporre is a prominent inventor located in Albany, NY, recognized for his contributions to the field of semiconductor technology. With a keen focus on innovation, he has made significant advances in the fabrication of nanosheet semiconductor devices, ultimately leading to the issuance of a patent that exemplifies his expertise and creativity.

Latest Patents: Sporre holds a patent for a groundbreaking concept titled "Nanosheet channel-to-source and drain isolation." This patent introduces a method and structures for fabricating a nanosheet semiconductor device. The invention details a fabrication process involving nanosheet fins, which consist of alternating layers of silicon (Si) and silicon germanium (SiGe). These layers are strategically etched to define the dimensions of the nanosheet fins, allowing for precise control in semiconductor applications. The innovative design includes unique undercut features and the incorporation of dielectric materials, enhancing the performance and integration of the semiconductor device.

Career Highlights: John R. Sporre works at Adeia Semiconductor Solutions LLC, where his passion for innovation drives the advancement of semiconductor technologies. His role at the company is critical as he continues to develop and refine cutting-edge solutions within the industry. The patent he secured stands as a testament to his skill and dedication in this fast-evolving field.

Collaborations: Throughout his career, Sporre has collaborated with talented professionals including Marc A. Bergendahl and Kangguo Cheng. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the development of innovative semiconductor solutions.

Conclusion: John R. Sporre is a distinguished inventor in the realm of nanosheet semiconductor technology, with a proven track record of innovation and collaboration. His patent, which focuses on enhancing semiconductor device fabrication, underscores his commitment to pushing the boundaries of technological advancement. As he continues to work at Adeia Semiconductor Solutions LLC, the industry can expect further innovations that will shape the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…