This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1989-1995.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1989-1995
Title: Innovations by John R Rudert, Jr.
Introduction
John R Rudert, Jr. is a notable inventor based in Fishkill, NY (US). He has made significant contributions to the field of electron beam lithography, particularly in the fabrication of complex computer chips. With a total of 2 patents, his work has advanced the efficiency and effectiveness of data compaction techniques.
Latest Patents
One of his latest patents is titled "Data compaction techniques for generation of a complex image." This patent describes a data compaction technique that allows electron beam lithography systems to operate more efficiently. The method involves selecting building block patterns for design encoding, assigning sequence numbers to each shape, and storing shape descriptors in a reference memory. The data word referencing a block includes bytes that specify stored block pattern data and control bits corresponding to sequence numbers.
Another significant patent is "Pattern splicing system and method for scanning of electron beam system." This invention provides a system and algorithmic method for scanning an electron beam in a predetermined pattern over a surface divided into a matrix of sub-fields. The system determines the boundary portions of the pattern in selected sub-fields and stores the coordinates in memory. The electron beam scans the surface to fully expose it, while boundary portions are spliced for adjacent sub-fields.
Career Highlights
John R Rudert, Jr. is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of electron beam lithography. His work has been instrumental in enhancing the capabilities of computer chip fabrication.
Collaborations
He has collaborated with Robert A Simpson, contributing to advancements in their shared field of expertise.
Conclusion
John R Rudert, Jr. is a distinguished inventor whose patents have significantly impacted the efficiency of electron beam lithography. His contributions continue to shape the future of computer chip fabrication.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile