This inventor holds 3 USPTO granted patents and 8 published patent applications. Top assignee: Rohm and Haas Electronic Materials Cmp Holdings, Inc.. Active years: 2004-2023.
Location History:
- Appleton, WI (US) (2004)
- Exton, PA (US) (2022 - 2023)
Company Filing History:
2 out of 311 
Years Active: 2004-2023
Title: Innovations of John R McCormick
Introduction
John R McCormick is an accomplished inventor based in Exton, PA (US). He has made significant contributions to the field of chemical mechanical polishing, holding a total of 3 patents. His work has been instrumental in advancing technologies used in various applications.
Latest Patents
One of his latest patents is for a CMP polishing pad with polishing elements on supports. This innovative polishing pad features a base pad with a top surface and a plurality of polishing elements. Each polishing element is connected to the base pad by three or more supports, creating a region with at least one void and openings between the supports. This design enhances the efficiency of polishing substrates when used with a polishing medium.
Another notable patent is for a CMP polishing pad with lobed protruding structures. This polishing pad comprises a base and multiple structures that protrude from it. The cross-section of these structures can have six or more inflection points or consist of three or more lobes. The Delta parameter of the cross-section ranges from 0.2 to 0.75, which contributes to the pad's effectiveness in chemical mechanical polishing.
Career Highlights
John R McCormick is currently employed at Rohm and Haas Electronic Materials CMP Holdings, Inc. His work at this company has allowed him to focus on developing innovative solutions in the field of electronic materials.
Collaborations
He has collaborated with various professionals in his field, including his coworker Bryan E Barton. Their joint efforts have contributed to the advancement of technologies in chemical mechanical polishing.
Conclusion
John R McCormick's contributions to the field of chemical mechanical polishing through his patents and collaborations highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.