This inventor holds 4 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1976-1984.
Company Filing History:
Years Active: 1976-1984
Title: John R Kranik: Innovator in Ion Implantation Technology
Introduction
John R Kranik is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of ion implantation technology, holding a total of 4 patents. His work has been instrumental in advancing the efficiency and effectiveness of various industrial processes.
Latest Patents
Kranik's latest patents include innovative designs that enhance the functionality of ion implantation apparatuses. One of his key inventions is the "Punch apparatus," which features an improved interposer punch apparatus. This apparatus includes a plurality of elongated punch elements, a head that supports the punch elements, and a means to urge the punch elements into an extended position. The design also incorporates a stripper plate and a base that supports a substrate to be punched. A notable improvement in this invention is the mechanism that forcibly displaces slugs of material punched from a substrate, ensuring a more efficient operation.
Another significant patent is the "Cooled target disc for high current ion implantation method and apparatus." This invention involves a rotating target ion bombardment apparatus equipped with a cooling arrangement. The cooling system utilizes a pattern of air openings and air fins to effectively manage heat during operation. By reducing the conductive cross-section between the hub region and the outer work region of the disc, Kranik's design enhances the longevity of the ferrofluidic feedthrough means, thereby improving the overall performance of the apparatus.
Career Highlights
John R Kranik is associated with the International Business Machines Corporation (IBM), where he has contributed to various innovative projects. His expertise in ion implantation technology has positioned him as a key figure in the development of advanced manufacturing processes.
Collaborations
Throughout his career, Kranik has collaborated with esteemed colleagues such as Wolfgang F Mueller and Herbert Lorenz Arndt, Jr. These collaborations have further enriched his work and contributed to the success of his inventions.
Conclusion
John R Kranik's contributions to ion implantation technology through his patents and work at IBM highlight his innovative spirit and dedication to advancing industrial processes. His inventions continue to influence the field and pave the way for future advancements.