International Business Machines Corporation

John R Kranik

Wolfgang F Mueller

George E Melvin

Demetrios Balderes

Charles John Lucas

Herbert Lorenz Arndt, Jr

Erich H Bayer

An improved interposer punch apparatus including a plurality of elongated punch elements, a head slidably supporting the punch elements, means to urge the punch elements in an extended position, a stripper plate, and a base for supporting a substrate to be punched with apertures for receiving the lower ends of the punch elements, the imrovement being a means in said base for forcibly displacing slugs of material punched from a substrate from the ends of the punch elements following a punching operation.

Punch apparatus

A rotating target ion bombard or implant apparatus with an arrangement for cooling the target. The cooling arrangement utilizes a pattern of air openings or passages and air fins. The pattern of air openings are positioned concentric to the disc hub and act to separate the hub region of the disc from the outer target or work region. The air openings function to both reduce the conductive cross-section between the hub region and outer work region of the disc and permit air to pass from the implant or bombard side to the back surface thereof. The air fins are provided on the back surface of the disc to draw air through the openings when rotating. Cooling is achieved by rotating in atmosphere during the load/unload cycle of operation. Reduction of the conductive cross-section between work region and hub region reduces heat transfer to the ferrofluidic feedthrough means coupled to the hub region thereby increasing the ferrofluidic feedthrough means lifetime.

Cooled target disc for high current ion implantation method and apparatus

A chuck for a workpiece, rotatable in spaced relation to and about an axis of rotation, and having a clamp jaw radially movable under centrifugal force to engage the workpiece against fixed mating clamp members. The structure can also have optional means enabling the chuck to tilt, with the workpiece, from a home position to a preselected angle under the rotation thereof about a pivot axis perpendicular to and spaced from the axis of rotation with return of the chuck to the home position under gravitational force when rotation thereof is stopped.

Centrifugal support for workpieces

Disclosed is ion implantation apparatus in which an ion source is coupled to a semiconductor or workpiece holder which is mounted for rotation and reciprocation in a first chamber in the path of the ion beam. A second chamber is releasably coupled to the first chamber with means connected to the second chamber in such a manner as to enable displacement between the first and second chamber, the chambers being in fluid communication with one another when the apparatus is in operation. Vacuum drawing means are provided to effect a vacuum in both the first and second chamber when the apparatus is in operation, and when it is desired to withdraw the holder from the apparatus by disconnecting the second chamber from the first chamber, venting the first chamber automatically actuates a check valve which seals the second chamber permitting the retention of a vacuum in the second chamber while allowing the first chamber to be exposed to atmospheric pressure.

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Poughkeepsie, NY, United States of America

John R Kranik