This inventor holds 7 USPTO granted patents. Top assignee: Eastman-Kodak Company. Active years: 1979-1984.
Company Filing History:
Years Active: 1979-1984
Title: The Innovations of John R. Guild
Introduction
John R. Guild, an accomplished inventor based in Rochester, NY, holds an impressive portfolio of seven patents. His innovative contributions primarily focus on light-sensitive compositions and resist developers. Guild's work significantly impacts the fields of photoresists and lithographic printing.
Latest Patents
Among his latest inventions is the "Development of light-sensitive quinone diazide compositions." This patent details the creation of light-sensitive compositions containing quinone diazide, which serve important roles in positive-working photoresists and lithographic printing plates. These compositions use a developing solution incorporating a quaternary alkanol ammonium hydroxide agent along with a stabilizing amount of semicarbazide.
Another significant patent from Guild is titled "Resist developer with ammonium or phosphonium compound and method of use." This innovation describes resist developers featuring additives derived from specific tetraalkylammonium or phosphonium cations. These compounds enhance the selectivity of the developers, making them more effective in their applications.
Career Highlights
Throughout his career, John R. Guild has been linked with the Eastman Kodak Company, where he has made notable strides in developing advanced lithographic materials. His contributions have not only pushed technological boundaries but also strengthened the position of his employer in the competitive field of imaging technology.
Collaborations
Guild has worked alongside his coworker Robert C. Daly, fostering a collaborative environment that encourages innovation and the sharing of ideas. Together, they have contributed to advancements that have shaped practices within the industry.
Conclusion
John R. Guild's inventive spirit and dedication to innovation within the field of light-sensitive materials have led to significant advancements in photoresist technology. His patents underline the importance of creativity and collaboration in advancing scientific and industrial practices, with lasting implications for the future of lithography and printing technologies.