Irvine, CA, United States of America

John Peter Rentzepis

This inventor holds 2 USPTO granted patents. Top assignee: Other. Active years: 1995-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John Peter Rentzepis. Retrieved from https://idiyas.com/inventor/john-peter-rentzepis

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 26(Granted Patents)


Company Filing History:

goldMedal2 out of 834,513 
Other
 patents

Years Active: 1995-1999

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2 patents (USPTO):Explore Patents

Title: Innovations of John Peter Rentzepis

Introduction

John Peter Rentzepis is a notable inventor based in Irvine, California. He has made significant contributions to the field of x-ray technology, particularly in the development of compact high-intensity pulsed x-ray sources. With a total of two patents to his name, Rentzepis continues to push the boundaries of innovation in his field.

Latest Patents

His latest patent focuses on a compact high-intensity pulsed x-ray source, specifically designed for lithography. This invention utilizes a photoemissive photocathode, which is a metal with a low work function, preferably tantalum-surfaced cesium-antimonide. The photocathode is illuminated with pulses of 5320 Å laser light, typically at a 20 picosecond duration and a 20 Hz repetition rate, to emit electrons through the photoelectric effect. The emitted electrons are collected in a spatial region near the photocathode by a grid electrode. The same laser pulses activate a semiconductor switch, usually an LiTaO3 crystal doped with 2.24% Cu, to apply a high voltage of approximately 100 kV between the photocathode and an anode. The accumulated electrons are then accelerated and focused into an electron beam that strikes the anode, typically in a focal spot of less than 0.5 mm in diameter. This process produces time-resolved x-ray pulses, typically in the K band, with a duration of 20 picoseconds and an energy range of 4-10 microjoules each. The x-ray source generates a uniform flux of hard x-rays over a large 20 cm² anode area, making it suitable for lithography applications.

Career Highlights

Throughout his career, Rentzepis has demonstrated a commitment to advancing x-ray technology. His innovative approach has led to the development of reliable and efficient x-ray sources that are essential for various applications in the field of lithography.

Collaborations

Rentzepis has collaborated with his coworker, Peter M Rentzepis, to further enhance the research and development of their innovative technologies.

Conclusion

John Peter Rentzepis is a distinguished inventor whose work in compact high-intensity pulsed x-ray sources has made a significant impact in the field of lithography. His contributions continue to inspire advancements in x-ray technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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