John M Nagarah

Title: John M Nagarah: Innovator in Semiconductor Technology

Introduction

John M Nagarah is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, particularly in the area of mask stripping processes. His innovative approach has led to advancements that benefit the manufacturing of electronic components.

Latest Patents

John M Nagarah holds a patent for a method titled "Method of stripping organic mask with reduced damage to low-K film." This patent describes a technique for stripping an organic mask above a porous low-k dielectric film. The method involves a steady state flow of a stripping gas, comprising CO and CH, which is formed into a plasma. This plasma effectively strips at least half of the organic mask while protecting the porous low-k dielectric film during the process.

Career Highlights

John M Nagarah is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to apply his innovative ideas and contribute to the development of advanced manufacturing processes.

Collaborations

Throughout his career, John has collaborated with various professionals in the field, including his coworker Gerardo Delgadino. These collaborations have fostered an environment of innovation and have led to the successful implementation of new technologies.

Conclusion

John M Nagarah's contributions to semiconductor technology through his innovative patent and work at Lam Research Corporation highlight his role as a key figure in the industry. His dedication to advancing manufacturing processes continues to impact the field positively.