This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1980.
Company Filing History:
Years Active: 1980
Title: Innovations of John Kobliska in Amorphous Metallic Alloys
Introduction
John Kobliska is an accomplished inventor based in Mount Kisco, NY (US). He is known for his significant contributions to the field of materials science, particularly in the development of amorphous metallic and nitrogen-containing alloy films. His innovative work has led to advancements in the properties and applications of these materials.
Latest Patents
Kobliska holds a patent for "Amorphous metallic and nitrogen containing alloy films." This patent describes a unique composition of amorphous metal-alloy films that include nitrogen and at least one transition metal selected from chromium, iron, cobalt, and nickel. The films are formed through a deposition process in a vacuum chamber, utilizing sputtering techniques in a nitrogen and inert gas atmosphere. The resulting alloys exhibit improved adhesion, corrosion resistance, and hardness, making them suitable for various applications.
Career Highlights
Throughout his career, Kobliska has been associated with the International Business Machines Corporation (IBM), where he has contributed to research and development in advanced materials. His work has not only enhanced the understanding of magnetic properties but also improved the thermal stability of these films under various conditions.
Collaborations
Kobliska has collaborated with notable colleagues, including Jerome J Cuomo and Amitava Gangulee. These partnerships have fostered a collaborative environment that has led to further innovations in the field of materials science.
Conclusion
John Kobliska's contributions to the development of amorphous metallic and nitrogen-containing alloy films have made a significant impact in materials science. His innovative work continues to influence the industry and pave the way for future advancements.