Location History:
- Austin, TX (US) (1998)
- Round Rock, TX (US) (1995 - 2001)
Company Filing History:
10 out of 12,890 
1 out of 23 Years Active: 1995-2001
Title: John K. Lowell: Innovator in Semiconductor Technology
Introduction
John K. Lowell is a prominent inventor based in Round Rock, TX (US), known for his significant contributions to semiconductor technology. With a total of 11 patents to his name, Lowell has made remarkable advancements in the field, particularly in plasma etching techniques and the assessment of net charge in semiconductor substrates.
Latest Patents
One of Lowell's latest patents is a "Device for reducing plasma etch damage and method for manufacturing same." This invention presents an improved sputter etching technique that effectively prevents or reduces plasma etch damages associated with sputter etching. The technique utilizes a semiconductor wafer with at least one diode formed within an inactive region near the wafer's outer periphery. This diode prevents charge transfer or arcing between the grounded anode and the p-channel gate region, minimizing issues such as gate oxide breakdown and threshold voltage skew. Additionally, a standard wafer can be retrofitted to include a diode for similar beneficial results.
Another notable patent is related to "In-line detection and assessment of net charge in PECVD silicon dioxide." This method allows for the detection and assessment of net charge in a PECVD oxide layer deposited on a semiconductor substrate. The technique involves measuring electrical potential differences across PECVD oxide layers on as-produced semiconductor substrates. The measurements are non-contact and non-destructive, making them suitable for use during or after the wafer fabrication process.
Career Highlights
Throughout his career, John K. Lowell has worked with notable companies such as Advanced Micro Devices Corporation and Advanced Micro Device, Inc. His work has significantly impacted the semiconductor industry, leading to advancements that enhance the performance and reliability of semiconductor devices.
Collaborations
Lowell has collaborated with esteemed colleagues, including Tim Z. Hossain and Fred N. Hause. These collaborations have contributed to the development of innovative technologies in the semiconductor field.
Conclusion
John K. Lowell's contributions to semiconductor technology through his patents and collaborations have established him as a key figure in the industry. His innovative approaches continue to influence advancements in semiconductor manufacturing and design.