Crawley Down, United Kingdom

John J Perrins

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John J Perrins. Retrieved from https://idiyas.com/inventor/john-j-perrins

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 42(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: John J Perrins: Innovator in Ion Implantation Technology

Introduction

John J Perrins is a notable inventor based in Crawley Down, GB. He has made significant contributions to the field of ion implantation technology, which is crucial in semiconductor manufacturing. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of ion implantation processes.

Latest Patents

John J Perrins holds a patent for an Ion Implantation Apparatus. This apparatus features an implant wheel located within a vacuum chamber. The implant wheel is designed with multiple circumferentially distributed wafer holding positions and is capable of spinning to allow wafers to successively intercept an ion beam. The design includes a scanning arm that facilitates reciprocating movement, ensuring precise implantation angles. The tilt actuator, mounted on the scanning arm, allows for adjustments in the implantation angle while maintaining the alignment of the implant wheel's rotational axis.

Career Highlights

John J Perrins is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on advancing ion implantation technologies, which are essential for the production of high-performance semiconductor devices. His innovative contributions have positioned him as a key figure in the field.

Collaborations

Throughout his career, John has collaborated with esteemed colleagues such as Richard H Cooke and Stephen G Young. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in the semiconductor sector.

Conclusion

John J Perrins is a distinguished inventor whose work in ion implantation technology has made a significant impact on the semiconductor industry. His innovative apparatus and collaborative efforts continue to drive advancements in this critical field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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