The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 1997

Filed:

Mar. 28, 1996
Applicant:
Inventors:

Richard H Cooke, Storrington, GB;

John J Perrins, Crawley Down, GB;

Stephen G Young, Shoreham, GB;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H01J / ;
U.S. Cl.
CPC ...
25049221 ; 25044211 ;
Abstract

Ion implantation apparatus has an implant wheel in a vacuum chamber. The implant wheel has a number of circumferentially distributed wafer holding positions and is arranged to spin so that the wafers successively intercept an ion beam. The implant wheel is mounted at the free end of a scanning arm which itself is mounted for reciprocating movement on a wall of the vacuum chamber by means of a rotary vacuum seal. A wheel drive motor is mounted in the vacuum chamber on the rotational axis of the implant wheel and the wheel and drive motor combination can be tilted at the end of the scanning arm to adjust the angle of implantation. The tilt actuator is inside the vacuum chamber mounted on the scanning arm and the tilt axis is such that the axis of rotation of the implant wheel remains always in the same plane as the axis of scan of the scanning arm.


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