Company Filing History:
Years Active: 1987-1993
Title: Innovations by John J Donelon in Circuit Repair Technologies
Introduction
John J Donelon is a renowned inventor based in Mahopac, NY, known for his significant contributions to circuit repair technologies. With a total of three patents to his name, his innovations are pivotal in enhancing the reliability and efficiency of integrated circuits and substrates.
Latest Patents
Among his latest inventions, Donelon has developed advanced laser methods for circuit repair on integrated circuits and substrates. One notable patent outlines a technique that allows for the accessing and repair of electrical opens in conducting metal lines on semiconductor chips. This innovative method utilizes laser plating techniques to provide a maskless solution for repairing discontinuities in conductors on substrate surfaces. By locally irradiating the surface, a reversible carbonaceous layer is formed, which serves as a base for electrodeless metal deposition. Furthermore, Donelon’s method includes access to buried discontinuities, achieved by ablating the cover layer with a pulsed excimer laser.
Career Highlights
Donelon has made substantial advancements during his time at International Business Machines Corporation (IBM). His role at IBM has allowed him to leverage cutting-edge technology to develop practical solutions in circuit repair, making significant strides in semiconductor manufacturing processes.
Collaborations
Throughout his career, John J Donelon has collaborated with notable colleagues, including James Patrick Doyle and Jerry E Hurst, Jr. These partnerships have contributed to the successful development and implementation of innovative technologies within the realm of electrical engineering and semiconductor design.
Conclusion
John J Donelon continues to be an influential figure in the field of circuit repair technologies. His inventive spirit and dedication to advancing semiconductor repair methods not only benefit the industry but also pave the way for future innovations. As technology progresses, Donelon's work will undoubtedly remain a cornerstone in the ongoing development of integrated circuit applications.