John H McCoy

Title: Innovations of John H McCoy

Introduction

John H McCoy is a notable inventor based in San Carlos, CA (US). He holds a total of 10 patents that showcase his contributions to the field of lithography and semiconductor technology. His work has significantly impacted the efficiency and accuracy of projection systems used in various applications.

Latest Patents

One of his latest patents is an inspection tool for testing and adjusting a projection unit of a lithography system. This inspection system is designed to inspect a projection unit that contains multiple optical subsystems, which are essential for projecting images during lithography steps. The system features self-calibration capabilities by measuring both a test mask and the aerial image of the test mask using the same detector assembly. Additionally, it can measure multiple fields simultaneously with the help of multiple detectors and 6-axis interferometry, ensuring precise positioning of each detector. Furthermore, the system can measure the distance between the test mask and the detector assembly through an indirect path around the projection unit, which typically obstructs the direct path.

Another significant patent involves semiconductor wafer alignment using backside illumination. This projection exposure apparatus is designed to expose a semiconductor wafer to a pattern formed on a reticle, utilizing a projection lens system. An alignment optical system is strategically placed at the backside of the wafer, allowing it to detect an alignment mark on the frontside without interference from integrated circuit layers. This innovative approach ensures accurate alignment of the reticle and wafer, while also detecting and correcting any tilting or wedging of the wafer.

Career Highlights

Throughout his career, John H McCoy has worked with prominent companies such as Nikon Corporation and Nikon Precision Incorporated. His experience in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in the field.

Collaborations

John has collaborated with notable individuals in the industry, including Kyoichi Suwa and Michael R Sogard. These partnerships have further enhanced his work and led to significant advancements in his projects.

Conclusion

John H McCoy's contributions to the field of lithography and semiconductor technology are noteworthy. His innovative patents and collaborations have played a crucial role in advancing the efficiency and accuracy of projection systems. His work continues to influence the industry and inspire future innovations.