Dublin, Ireland

John G Woods

This inventor holds 21 USPTO granted patents and 1 published patent application, primarily in Polymer Chemistry. Top assignees: Loctite (Ireland) Limited, Loctite Corporation. Active years: 1983-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John G Woods. Retrieved from https://idiyas.com/inventor/john-g-woods

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 21 

% Patents Active = 100.0

Average Co-Inventor Count = 2.8

ph-index = 12

Forward Citations = 467(Granted Patents)


Location History:

  • Stillorgan, IE (1985 - 1987)
  • Co. Dublin, IE (1991)
  • Stillorgan, CT (US) (1991)
  • County Dublin, IE (1993)
  • Dublin, IE (1983 - 1994)

Company Filing History:


Years Active: 1983-1994

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Areas of Expertise:
Anionically Polymerizable Monomers
Photoresists
Thiol/Ene Compositions
Calixarene Adhesives
Conformal Coating Systems
Polymerizable Styryloxy Resins
Instant Adhesive Composition
Polymer Bound Calixarenes
UV Curable Adhesive Tape
Acrylic Compositions
Vapor Deposition
Radiation-Activatable Adhesives
21 patents (USPTO):Explore Patents

Title: The Innovative Mind of John G Woods: Pioneering Patents in Microlithography

Introduction: John G Woods is a distinguished inventor based in Dublin, Ireland, renowned for his groundbreaking work in the field of microlithography. With an impressive portfolio of 21 patents, Woods has made significant contributions to the development of anionically polymerizable monomers and polymers with exceptional dry etch resistance properties, essential for high-precision microfabrication processes.

Latest Patents: Among Woods' latest patents is the creation of anionically polymerizable monomers containing silicon or titanium atoms, enabling the production of polymeric photoresists ideal for microlithography applications. These innovative monomers, characterized by their unique chemical structure, have revolutionized the field by enhancing the performance of photoresist coatings in dry etch processes. Additionally, Woods has pioneered the development of photoresists made from di-unsaturated monomers, enabling the precise formation of positive or negative tone images through advanced imaging techniques.

Career Highlights: Throughout his career, John G Woods has held key roles at prominent companies such as Loctite (Ireland) Limited and Loctite Corporation, where he has spearheaded research and development initiatives focused on cutting-edge materials and processes. His expertise in polymer chemistry and microfabrication has positioned him as a leading figure in the field, garnering recognition for his innovative solutions that have advanced the capabilities of microlithography technologies.

Collaborations: Woods has collaborated closely with esteemed colleagues in his field, including John M Rooney and Stephen J Harris, who have contributed to the success of his research endeavors. Together, they have worked towards pushing the boundaries of innovation in microlithography, exploring novel approaches to photoresist formulation and application techniques that have reshaped industry standards.

Conclusion: John G Woods' legacy as an inventor in the realm of microlithography is characterized by his relentless pursuit of excellence and his unwavering commitment to pushing the boundaries of technological advancement. Through his groundbreaking patents and collaborative efforts, Woods has cemented his reputation as a visionary in the field, leaving a lasting impact on the realm of microfabrication and materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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