This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: Innovations by John G North
Introduction
John G North is a notable inventor based in Tempe, AZ (US). He has made significant contributions to the field of chemical vapor deposition (CVD) technology. His innovative approach has led to the development of a unique method for controlling the movement of reaction by-product gases in CVD processes.
Latest Patents
John G North holds 1 patent for his invention titled "Method and apparatus for controlling the movement of CVD reaction byproduct gases to adjacent process chambers." This patent describes a method and apparatus designed to manage the migration of reaction by-product gases from a CVD process chamber to a transfer vacuum chamber. The invention includes separate regulated flows of purge gas to both the CVD process chamber and the transfer vacuum chamber, which are established before creating a pathway for substrate transfer. A pressure differential is generated between the two chambers, effectively reducing or preventing the migration of CVD reaction by-product gases during substrate transfer. Additionally, a directional flow of purge gas is maintained from the transfer vacuum chamber into the CVD process chamber while the pathway is established.
Career Highlights
John G North is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on enhancing the efficiency and effectiveness of CVD processes, which are critical in the production of semiconductor devices.
Collaborations
Throughout his career, John has collaborated with notable colleagues, including Joseph T Hillman and Steven P Caliendo. These collaborations have contributed to advancements in CVD technology and have fostered a productive working environment.
Conclusion
John G North's innovative contributions to CVD technology demonstrate his expertise and commitment to advancing the field. His patent reflects a significant step forward in managing by-product gases, which is essential for improving the efficiency of semiconductor manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile