Ithaca, NY, United States of America

John G Carter

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Rohm & Haas Electronic Materials LLC. Active years: 2009-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John G Carter. Retrieved from https://idiyas.com/inventor/john-g-carter-mumb0srn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2009-2015

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2 patents (USPTO):Explore Patents

Title: The Innovations of John G. Carter

Introduction

John G. Carter is a notable inventor based in Ithaca, NY (US). He has made significant contributions to the field of plating methods, holding a total of 2 patents. His work focuses on improving the processes involved in depositing metals and metal alloys on various substrates.

Latest Patents

Carter's latest patents describe innovative methods for depositing a metal or metal alloy on a substrate. The techniques involve electrolytic deposition, where the current is periodically interrupted during the process. This interruption enhances throwing power and minimizes nodule formation on the metal or metal alloy deposit. These advancements are crucial for improving the quality and efficiency of metal plating.

Career Highlights

Carter is currently employed at Rohm & Haas Electronic Materials LLC, where he continues to develop and refine his plating methods. His expertise in this area has positioned him as a valuable asset to the company and the industry at large.

Collaborations

Throughout his career, Carter has collaborated with notable colleagues, including Jacek M. Knop and Donald E. Cleary. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

John G. Carter's contributions to the field of plating methods demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in metal deposition, making him a significant figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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