Portland, OR, United States of America

John Folden Stumpf

USPTO Granted Patents = 6 

Average Co-Inventor Count = 1.9

ph-index = 1

Forward Citations = 5(Granted Patents)


Location History:

  • Kettering, OH (US) (2014 - 2015)
  • Portland, OR (US) (2023 - 2024)

Company Filing History:


Years Active: 2014-2025

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6 patents (USPTO):Explore Patents

Title: Innovations of John Folden Stumpf

Introduction

John Folden Stumpf is a notable inventor based in Portland, Oregon. He has made significant contributions to the field of gas dosing and flow measurement technologies. With a total of six patents to his name, Stumpf's work has advanced various industrial processes.

Latest Patents

Stumpf's latest patents include innovative systems for divertless gas dosing. These systems are designed to enhance the efficiency of process gases in deposition systems. One of his notable inventions is a divertless, pressure-based gas-dosing system that features a process gas inlet, a flow controller, and a line charge-volume (LCV). This system allows for precise control of gas dosing, improving overall process reliability. Another significant patent involves differential-pressure-based flow meters. This apparatus includes a flow-restrictor element that creates a pressure drop, allowing for accurate fluid measurement through differential pressure sensing.

Career Highlights

Stumpf is currently employed at Lam Research Corporation, where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in developing technologies that enhance the efficiency and effectiveness of gas delivery systems.

Collaborations

Stumpf has collaborated with notable colleagues such as Karl Frederick Leeser and Timothy Dyer. Their combined expertise has contributed to the successful development of advanced technologies in their field.

Conclusion

John Folden Stumpf's contributions to gas dosing and flow measurement technologies have made a significant impact in the industry. His innovative patents and collaborative efforts continue to drive advancements in semiconductor manufacturing processes.

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