Company Filing History:
Years Active: 1996-2002
Title: The Innovations of John Damiano, Jr.
Introduction
John Damiano, Jr. is a notable inventor based in Austin, TX, with a significant contribution to the field of thin film transistors. He holds a total of six patents, showcasing his expertise and innovative spirit in technology.
Latest Patents
Among his latest patents is a groundbreaking invention related to thin film transistors and methods for forming them. This invention includes a thin film transistor layer comprising a source region, a channel region, and a drain region. Notably, the thin film transistor layer features a drain offset region positioned between the drain region and the channel region. The channel region is substantially polycrystalline and has a first average crystalline grain size, while the drain offset region also consists of polycrystalline material but has a second average crystalline grain size that is larger than the first. The patent also discloses a method for forming this construction using polycrystalline materials, preferably polysilicon, along with an amorphizing silicon implant and subsequent recrystallization.
Career Highlights
John Damiano, Jr. is currently employed at Micron Technology Incorporated, where he continues to push the boundaries of innovation in semiconductor technology. His work has significantly impacted the development of advanced electronic components.
Collaborations
Some of his notable coworkers include Shubneesh Batra and Monte Manning, who contribute to the collaborative environment at Micron Technology Incorporated.
Conclusion
John Damiano, Jr. exemplifies the spirit of innovation through his patents and contributions to the field of thin film transistors. His work continues to influence the technology landscape, making him a key figure in the industry.