Columbus, OH, United States of America

John D Redmyer


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 1977

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of John D. Redmyer

Introduction

John D. Redmyer is a notable inventor based in Columbus, Ohio. He has made significant contributions to the field of optical gauging devices. His innovative work has led to the development of a unique patent that enhances measurement accuracy.

Latest Patents

Redmyer's most recent patent is for a Reticle Calibrated Diameter Gauge. This non-contact optical gauging device utilizes a laser beam that is deflected to produce a bidirectional scan. The device features a split beam; one portion scans the object being inspected while the other scans a calibration reticle with alternating opaque and transparent bands. The alternating transmission and occlusion of the beam through the reticle generate calibration pulses, which represent predetermined increments of movement. The occlusion of the measuring beam by the object generates a signal that controls the counting of calibration pulses, indicating the dimension being measured. Bidirectional averaging is employed to minimize errors caused by object motion during the scanning process.

Career Highlights

John D. Redmyer is associated with Autech Corporation, where he has contributed his expertise in optical measurement technologies. His work has been instrumental in advancing the capabilities of non-contact gauging devices.

Collaborations

Throughout his career, Redmyer has collaborated with notable colleagues, including David E. Harris and Robert M. Watson. Their combined efforts have fostered innovation and development in their respective fields.

Conclusion

John D. Redmyer's contributions to optical gauging technology exemplify the spirit of innovation. His patented Reticle Calibrated Diameter Gauge represents a significant advancement in measurement accuracy.

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