John D Barry

Title: Innovations of John D Barry in Nano-Lithography

Introduction

John D Barry is a prominent inventor based in College Park, MD (US). He has made significant contributions to the field of nano-lithography, holding 2 patents that showcase his innovative approach to photolithographic technology. His work focuses on enhancing light transmission and resolution in photolithographic masks, which are crucial for integrated circuit design.

Latest Patents

One of his latest patents is titled "Photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays for imaging patterns in nano-lithography." This invention involves a nanophotolithography mask that includes a layer of an electrically conductive optically opaque material deposited on a mask substrate. Regular arrays of sub-wavelength apertures are formed within this layer. The plasmonic excitation generated by light incident on the mask produces high-resolution far-field radiation patterns. These patterns are intense enough to expose a photoresist on a wafer, leading to significant advancements in mask manufacturing throughput. The mask demonstrates defect resiliency and the ability to imprint coherent clear features of nano dimensions and shapes on wafers.

Another notable patent is the "Stepper system for ultra-high resolution photolithography using photolithographic mask exhibiting enhanced light transmission due to utilizing sub-wavelength aperture arrays." This stepper system employs a photolithographic mask similar to the one described above. It is designed to work with light wavelengths ranging from 197 nm to 248 nm, producing high-resolution far-field radiation patterns that can effectively expose photoresist on wafers. The system is resilient to mask defects and can imprint coherent clear features of various shapes and nano dimensions ranging from 45 nm to 500 nm.

Career Highlights

John D Barry is affiliated with the University System of Maryland, where he continues to push the boundaries of research in nano-lithography. His innovative work has positioned him as a key figure in the development of advanced photolithographic technologies.

Collaborations

Throughout his career, John has collaborated with notable colleagues such as Martin C Peckerar and Mario Dagenais. These collaborations have further enriched his research and contributed to the advancements in the field.

Conclusion

John D Barry's contributions to nano-lithography through his innovative patents have significantly impacted the field of integrated circuit design. His work continues to inspire advancements in phot