Shenzhen, China

John C Chai

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Shenzhen Envicool Technology Co., Ltd. Active years: 2024.

USPTO Granted Patents = 1 

% Patents Active = 100.0


Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: John C Chai: Innovator in Heat Sink Technology

Introduction

John C Chai is a notable inventor based in Shenzhen, China. He has made significant contributions to the field of thermal management through his innovative designs. His work primarily focuses on enhancing the efficiency of heat dissipation systems.

Latest Patents

One of John C Chai's key inventions is a hybrid heat sink. This innovative design includes a solid heat dissipation module and a TS heat dissipation module. The solid heat dissipation module features a solid substrate and solid fins, with the first side surface designed for contacting a heat source. The TS heat dissipation module comprises a TS substrate and TS fins, which are fixed to the TS substrate. A receiving cavity for a phase-change working medium is formed in the TS substrate, while condensation reflux cavities in the TS fins communicate with the receiving cavity. This design allows for improved thermal management in various applications.

Career Highlights

Throughout his career, John C Chai has worked with several companies, including Shenzhen Envicool Technology Co., Ltd and Shenzhen Envicool Information Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in heat sink technology.

Collaborations

John has collaborated with talented individuals such as Viacheslav Stetsyuk and Ye Wang. These partnerships have fostered innovation and creativity in his projects.

Conclusion

John C Chai is a prominent inventor whose work in hybrid heat sink technology has made a significant impact in the field of thermal management. His innovative designs and collaborations continue to inspire advancements in this area.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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