Plainfield, IL, United States of America

John Arthur Carlisle

USPTO Granted Patents = 16 

Average Co-Inventor Count = 3.6

ph-index = 5

Forward Citations = 339(Granted Patents)


Location History:

  • Romeoville, IL (US) (2013 - 2016)
  • Plainfield, IL (US) (2004 - 2021)

Company Filing History:


Years Active: 2004-2021

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16 patents (USPTO):Explore Patents

Title: Innovations of John Arthur Carlisle

Introduction

John Arthur Carlisle is a prominent inventor based in Plainfield, Illinois. He holds a remarkable portfolio of 16 patents, showcasing his contributions to the field of advanced materials and electrochemistry. His work primarily focuses on the development of durable composite diamond electrodes and films, which have significant applications in various industries.

Latest Patents

One of his latest patents is the "Extreme Durability Composite Diamond Electrodes." This invention discloses a durable composite diamond electrode that comprises a relatively thicker conductive Ultrananocrystalline Diamond (UNCD) layer on a substrate, underlying a relatively thinner conductive Microcrystalline Diamond (MCD) layer. The electrode is designed to exhibit long life and superior delamination resistance under extremely stressed electrochemical oxidation conditions. The improvement in electrode reliability is hypothesized to result from a combination of stress relief by the composite film and the electrochemically durable overlying MCD layer. This diamond composite electrode can be applied to electrochemical applications requiring extreme voltages, current densities, and biomedical inertness.

Another significant patent is the "Extreme Durability Composite Diamond Film." This novel composite diamond film consists of a relatively thick layer of UNCD with a Young's modulus of less than 900 GPa and a relatively thin MCD outermost layer with a Young's modulus of greater than 900 GPa. It has been shown to exhibit superior delamination resistance under extreme shear stress. The combination of a thick but softer underlying UNCD layer with a thin but harder overlying MCD layer provides an excellent compromise between low deposition cost and smoothness, along with extreme hardness and unparalleled chemical, electrochemical, and immunological inertness.

Career Highlights

Throughout his career, John Arthur Carlisle has worked with notable companies such as Advanced Diamond Technologies, Inc. and UChicago Argonne, LLC. His innovative work has significantly impacted the development of advanced materials, particularly in the field of diamond technology.

Collaborations

John has collaborated with esteemed colleagues, including Orlando H. Auciello and Prabhu U. Arumugam. Their joint efforts have contributed to the advancement of research in diamond materials and their applications.

Conclusion

John Arthur Carlisle's contributions to the field of advanced materials and electrochemistry are noteworthy. His innovative patents and collaborations have paved the way for significant advancements in the use of diamond technologies. His

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