Hyde Park, NY, United States of America

John A Paivanas


Average Co-Inventor Count = 2.3

ph-index = 8

Forward Citations = 241(Granted Patents)


Company Filing History:


Years Active: 1978-1986

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8 patents (USPTO):Explore Patents

Title: Innovations of John A Paivanas

Introduction

John A Paivanas is a notable inventor based in Hyde Park, NY (US). He has made significant contributions to the field of semiconductor technology and flexible material handling. With a total of 8 patents, his work has had a considerable impact on various industries.

Latest Patents

One of his latest patents is titled "Semiconductor assembly employing noneutectic alloy for heat dissipation." This invention provides a cooling means for circuit chip devices by utilizing a noneutectic metal alloy. The alloy forms a low thermal resistance bridging interface between the chip device and a heat sink. It is designed to maintain this interface at low thermal resistance, even under stress during circuit operation. Another recent patent is the "Pick-up head utilizing aspirated air flow." This device employs an aspirator jet suction mechanism to move green sheets or other flexible materials. It utilizes a source of gas under positive pressure to create a localized suction force, ensuring stable handling of flexible sheets.

Career Highlights

John A Paivanas has been associated with International Business Machines Corporation (IBM), where he has contributed to various innovative projects. His expertise in semiconductor technology and material handling has been instrumental in advancing the company's research and development efforts.

Collaborations

Throughout his career, John has collaborated with notable colleagues, including Javathu K Hassan and Javanthu K Hassan. These collaborations have further enriched his work and contributed to the success of various projects.

Conclusion

John A Paivanas is a distinguished inventor whose innovations in semiconductor technology and flexible material handling have made a lasting impact. His contributions continue to influence advancements in these fields.

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